硅钢资料

一种通过粉末烧结制备高磁性能含磷硅钢薄片的方法，属于粉末冶金技术领域。本发明通过真空熔炼气雾化制备成分范围为Fe‑(3‑6.5)wt.％Si‑(0.05‑1)wt.％P的合金粉，将其放置在陶瓷坩埚中均匀振实并放置重物压住，随后进行高温烧结使其冶金结合，再经热轧、冷轧、退火等处理后，得到具有优异性能的含磷硅钢薄片。本发明在硅钢材料体系中加入P元素，能够有效降低铁损、优化磁性能并促进活化烧结；采用气雾化粉末能够很好地保证产品的少夹杂和纯净度；在低熔点P元素及粉末压烧的协同作用下解决了球形气雾化粉末难以成形的缺陷，并避免了需添加成形剂导致的工艺复杂性及后续的脱胶残碳问题，有效缩短制备工艺流程，具有操作简单、生产效率高、工艺流程短、性能优异等优点。

一种超低硫硅钢冶炼工艺方法，属于炼钢技术领域。本发明公开了一种超低硫硅钢冶炼工艺方法，主要步骤包括KR铁水预处理—转炉冶炼—RH真空精炼—连铸保护浇注。在冶炼超低硫硅钢前，铁水包、转炉先处理1‑2炉低硫钢种，清洗设备；KR脱硫采用三次扒渣法，第一次扒除高炉出铁带渣，将铁水S含量脱至目标值后进行第二次扒渣，然后开通铁水包底吹，软吹后进行第三次扒渣，脱S后铁水S≤0.0005％，铁水兑入转炉后，热态下清理铁包结渣；转炉使用硫含量小于35ppm的低硫废钢，且废钢比不超过15％；RH和连铸过程均使用低硫合金及原辅料。本发明可使连铸结晶器钢水中S含量小于15ppm达标率由原来的48.6％左右提高至95％以上。

本发明公开了一种冷轧取向硅钢EBSD用样品电解抛光制样方法，包括：S1.机械抛光，切取10mm*10mm规格试样用超声仪清洗，在不同粒度的砂纸上预磨后在金相试样抛光机上抛光至镜面；S2.电解抛光，利用struerslectropol‑5型电解抛光机对机械抛光好的试样进行电解抛光；S3.EBSD检测。本发明主要解决现有设备技术条件下如何得到高质量的EBSD检测技术样品的问题，适用于大批量冷轧取向硅钢的EBSD样品制备，发明本方法后实验过程简单快捷，节约了实验时间和成本。

通过微观组织表征、高温拉伸和断口形貌分析,研究了钇(Y)元素对6.5%Si无取向硅钢组织、高温拉伸及断裂机制的影响。研究结果表明,添加Y元素可以在钢液中形成YS和YP的复合析出。YS和YP可以充当异质形核基底,提高形核率,细化凝固组织。热轧组织不均匀,由表层至芯部分别形成等轴晶、等轴晶/拉长晶和拉长晶的混合组织。退火后,热轧变形组织转变为等轴晶,含Y实验钢的退火组织得到明显细化。500℃时效处理后,含Y实验钢具备较低的有序度,300℃的拉伸断口呈现韧性断裂特征,断后伸长率达到20.2%。相反,无Y实验钢发生脆性断裂,断后伸长率仅为2.1%。研究结果证实,Y元素可以通过组织细化和降低有序度提高6.5%Si无取向硅钢的中温塑性。 The effects of yttrium(Y)on microstructure,elevated-temperature tensile properties and fracture mechanism of 6.5% Si non-oriented electrical steel were investigated by means of microstructure characterization,high-temperature tensile test and fracture analysis.The results showed that the doping of Y introduced composite Y-rich precipitates(YS/YP)in the melt.YS and YP precipitates were qualified for heterogeneous nucleation agents,which thus raised the nucleation rate and refined the solidificati... 

研究了电工钢SXRC的显微结构和疲劳性能,并与DP钢进行了比较。结果表明,退火温度低温化能够有效的抑制电工钢的再结晶。该钢在固溶铌的作用下,能够在保证电机磁性的同时具有一定的强度。与DP钢相比,SXRC钢的抗疲劳性能更好。 The microstructures and fatigue properties of the electrical steel SXRC we re investigated, and the properties were also compared with the steel DP. The results show that the recrystallization of the electrical steel can be suppressed at lower annealing temperature. The steel presents favorable motor magnetic and also a compatible strength with the help of solid-solution Nb. Compared with the steel DP, the fatigue resistance of the steel SXRC is preferable. 

研究了退火温度和退火时间对电沉积硅钢试样中的断面层组织、硅在试样中的分布情况、织构分布和磁性能的影响。结果表明:退火温度为1000℃、退火时间为210 min时得到的试样晶粒分布均匀、硅在试样中分布均匀、硅平均浓度为6.3715%(接近6.5%)。试样的织构分析及磁性能检测的结果表明,在较高温度下延长退火时间可增加{100}和{110}面织构,降低铁损,所得试样的磁性能较为良好。 The effect of annealing temperature and time on the microstructure, distribution of silicon,texture and magnetism of the high silicon steel prepared by electrodeposition was investigated. The results showed that after annealing at 1000℃ for 210 min, the mean grain size of steel was about 190 μm with a uniform grain size distribution, and the silicon is also uniformly distributed on the entire cross section with an average Si concentration 6.3715%(close to 6.5%); With the increasing annealing tim... 

采用电解法和扫描电镜研究了300 t转炉-RH精炼钙处理对无取向硅钢板（%:≤0.005C、1.2～2.2Si、0.2～0.6Mn、≤0.20P、≤0.005S、0.2～0.6Al、0～0.01Ca）中夹杂物的影响。结果表明,钢中Al含量为0.25%和0.35%时,钢中溶解氧均小于1×10^-4%,钙处理后都会产生CaS夹杂物,尤其是含0.35%Al的钢水;钙处理可以有效减少钢中的夹杂物数量,尤其是0.5μm以下的微细夹杂物数量;钙处理后夹杂物的种类以AlN、CaS为主,同时还含有少量的氧化物夹杂物以及AlN-CaS复合夹杂物,尺寸主要为1.5～5.0μm。 The effect of 300 t converter-RH refining calcium treatment on inclusions in non-oriented silicon steel sheet （%:≤0.005C,1.2～2.2Si,0.2～0.6Mn,≤0.20P,≤0.005S,0.2～0.6A1,0～0.01Ca） has been studied by electrolysis and scanning electron microscope.Results show that with 0.25%and 0.35%Al content in steel,all the dissolved oxygen in liquid is less than 1×10^-4%,and the CaS inclusions are produced after calcium treatment,especial for the liquid containing 0.35%Al;the amount of inclusions in ste... 

本实用新型涉及电机生产设备技术领域，特别涉及一种硅钢板冲裁余料处理工装，出料带通过支撑架平放在地面上，出料带的上方平行设置有安装在支撑架上的支撑砧板；支撑砧板的上方平行设置有上下滑动安装在支撑架上的刀架，刀架上设有切刀；支撑砧板的一端邻接有上料带，上料带将硅钢板冲裁余料送入到支撑砧板上。本实用新型的有益效果是：本实用新型可将成条的硅钢板冲裁余料进行自动裁切处理，裁切后的三角形的边角料会掉落到出料带中送出，此设备节省了大量的人力成本，提高了车间生产的安全性。

研究了冷轧大压下量,950℃退火时间对一种新型含铜无取向电工钢晶粒度和织构的影响。结果表明,大压下量冷轧,随压下量的增加,退火晶粒向γ线聚集,形成强{111}<112>织构。提高冷轧压下率,退火织构{111}<100>,{110}<001>强度减弱,增加退火时间,退火织构{111}<110>,{100}<001>,{110}<001>强度变弱。采用87.5%冷轧压下率和950℃退火60 s,有利织构{100},{110}占有率最大。 The effect of annealing(950 ℃) time with high cold rolling reduction on grain size and texture of a new non-oriented electrical steel containing copper was investigated.The results show that for high cold rolling reduction,most annealed grains are oriented along γ-fibre with increasing cold rolling reduction ratio and strong texture {111}<112> is formed.With increasing the cold rolling reduction ratio,the intensity of annealed texture {111}<110>,{011}<100> decreases.With increa... 

本发明涉及一种含磷无铝高效无取向硅钢生产方法，生产方法取消常化工艺，具体步骤如下：1)将钢水冶炼至目标成分后，浇铸成坯；2)板坯热装，热装温度≥500℃，热轧板坯加热炉均热段板坯温度1150～1200℃；终轧温度控制在860～930℃，卷取温度700～800℃3)酸洗后冷轧，控制冷轧整体压下率80％以内，至成品厚度；4)连续退火炉快速加热段温度设定1050～1180℃，增加有利织构组织形核，均热段温度设定830～950℃，全氮气干气氛保护，退火工艺速度120～150m/min，满足晶粒度8～4级。本发明不需进行热轧卷常化处理，降低了制造成本。

本文介绍了无取向硅钢C6涂液的性能,研究了配水量、固化程度和涂层厚度等因素对无取向硅钢C6涂层性能的影响。结果表明,随着配水量的增加,完全固化所需的时间增加,涂液固体含量降低,涂层厚度减小;随着固化程度的提高,涂层硬度先增大然后趋于恒定,而柔韧性逐渐变差,在过固化后急剧恶化;涂层厚度对涂层的表面外观、附着性和绝缘层间电阻均有显著影响。 Based on the introduction about the performance of C6 varnish for non-oriented silicon steel sheets,effects of water amount,curing degree and coating thickness are discussed. Results show that with the increase of water amount,the time required to cure completely extends,and both the solid content of C6 varnish and the coating thickness decrease. As the curing degree increases,the hardness of the coating increases first and then tends to be constant,however the flexibility degenerates,especially... 

试验了通过NaCl-KCl-NaF-SiO₂熔盐在电流密度50 mA/cm²、电沉积脉冲电流正反向比9:1和750⁸50℃60min电沉积下阴极（/mm）20×20×0.5的1.6Si无取向冷轧硅钢片断面层硅的分布,并通过计算得出Si的扩散系数。结果表明,电沉积温度由750℃提高至850℃时,试样中Si含量增加,扩散的深度由18μm提高到40μm;电沉积温度与Si在钢中的扩散系数近似符合Arrhenius指数关系。 The distribution of silicon at cross section of cathode（/mm） 20 × 20 × 0.5 sheet of 1.6Si non-oriented cold rolled silicon steel after electro-deposit treatment by NaCl-KCl-NaF-SiO₂ molten salt with current intensity 50 mA/cm²,electro-deposit pulse current positive-negative ratio 9:1 at 750 850 ℃ for 60 min has been tested and the diffusion coefficient of Si is obtained by calculation.Results show that with increasing electro-deposit temperature from 750 ℃ to 85...