硅钢资料

针对攀钢高硫铁水冶炼现状,结合不同生产工艺路线,论述了攀钢近年来为实现低硫电工钢的生产,在铁水预处理、转炉冶炼、钢水精炼过程中硫控制技术的开发与应用,形成了低硫洁净钢生产工艺技术,实现了低硫电工钢的生产。低硫电工钢RH脱硫率可达到20%左右,成品[S]控制在0.006%左右。 According to the smelting situations of hot metal with high sulphur content at Panzhihua Steel,combined with different produce processes,technologies for controlling the sulfur content during hot metal pretreatment,converter smelting,and second refining are developed. Technologies in low-sulfur clean steelmaking are formed. Low-sulfur electric steel are produced. As for the desulfurization rate of lowsulfur electric steel can reach about 20%,and the content of [S] in products is controlled to ab... 

采用X-射线衍射分析技术测定了取向硅钢热轧板在不同压下率下不同厚度处的织构。结果表明,在压下率低于80%的情况下,几乎所有试样的不同厚度处的织构均为旋转立方织构类型{100}<011>,但不同压下率、不同厚度处的织构强度存在很大差异;在压下率大于80%的情况下,不同试样的不同厚度处的织构类型发生了变化,其织构类型为旋转立方织构或高斯织构{011}<100>,且当织构类型为旋转立方织构时,织构强度存在很大差异,而当织构类型为高斯织构时,织构强度差异相对较小。 The texture of the grain oriented silicon steel hot rolled plate at different compressibility has been measured.The experimental results have shown that the texture of all samples at different thickness is {100}<011> when the compressibility is below 80%,and its intensity at different compressibility and thickness is difference.The texture of all samples at different thickness is variable when the compressibility is above 80%,it is {100}<011> or {011}<100>,and the intensity of ... 

研究了应用电感耦合等离子体质谱(ICP-MS)同时测定硅钢中痕量铝、钼、钒、钛、铌元素的分析方法。通过条件试验对测量参数进行了优化,确定RF功率1 400 W,泵速30rpm,采样深度140,雾化压力0.90。样品采用硝酸分解,以Be、Y混合内标校正了测量过程中高基体引起的信号漂移。根据测量时存在的质谱干扰情况,选择同位素27 Al、98 Mo、51 V、47 Ti和93 Nb作为测定同位素,同时通过调节仪器参数使得双电荷离子和氧化物离子的产率最低,以减少其带来的干扰。采用基体匹配法配制校准溶液,以标准加入法建立工作曲线,并扣除试剂空白。该方法各元素的测定下限均可达到1μg/g。用于硅钢标准样品的测定,所得结果与参考值完全吻合,各元素的RSD小于5.2%。 A method for the determination of trace aluminum,molybdenum,vanadium,titanium and niobium in silicon steel by inductively coupled plasma mass spectrometry(ICP-MS) was described.A series of single parameter condition experiment was conducted.The optimized operation parameters with RF power 1 400 W,turbo pump rate 30 rpm,sampling depth 140 and nebulizer pressure 0.90 were obtained.The samples were dissolved by HNO3,and the Be and Y mixing internal standard were used to eliminate the signal drift c... 

采用XRD、SEM和激光粒度仪等手段,观察并研究了不同特性氧化镁在硅钢表面形成硅酸镁底层形貌特点,并结合热力学和差热-失重分析了MgO-SiO2的反应机理。研究结果表明:粒度小,活性值高的特种氧化镁在高温退火过程中与基体表面氧化物生成的硅酸镁底层,界面中硅酸镁底层嵌入基体较多,表面致密,颗粒细小,有利于形成附着性能优良的硅酸镁底层。 Surface microstructure of Mg2SiO4 coatings formed on the surface of oriented silicon steel coated with different kinds of MgO was investigated by XRD and SEM.The reaction mechanism between MgO and SiO2 was analyzed by TG-DSC and thermodynamic calculation.Results revealed that when the MgO with finer microstructure size and higher activity is employed,a dense Mg2SiO4 layer with finer microstructure and good binding to the steel substrate can be obtained.The results are very helpful for the prepar... 

针对宝钢集团、日本新日铁住金和JFE公司公开的相关专利等资料,总结了国内外高强度无取向电工钢的研究进展,分析了不同电工钢的化学成分、生产工艺及产品性能,指出固溶强化、细晶强化、析出强化、位错强化都有可能被用来提高无取向电工钢的强度,并阐述了四种强化方式的优缺点;指出在高强度无取向电工钢的研发过程中,需根据其具体用途确定目标性能,再采用合适的强化手段,最终实现力学性能、磁性能和生产性能之间的平衡。 The research progress of high strength non-oriented electrical steels at home and abroad is summarized according to related patents brought into the public by Baosteel,Nippon Steel & Sumitomo Metal corporation and JFE corporation.The characteristics of chemical composition,production technology and properties of products in the patents are analyzed.Each of solution strengthening method,fine-grain strengthening method, precipitation strengthening method or dislocations strengthening method ma... 

采用CVD法制备6.5%Si高硅钢,介绍了具体的制备工艺过程,研究了温度对渗硅速率和试样质量减轻的影响,同时分析了扩散时间对高硅钢中硅分布的影响。结果表明:在CVD反应过程中,反应温度高于1050℃将大大提高渗硅速率,但当温度大于1200℃后,渗硅速率趋于稳定;渗硅后,试样会减轻、减薄,随着温度升高,试样质量减轻的速率逐渐增大,在1200℃左右趋于稳定;扩散时间越长,硅分布越均匀,结合制备效率进行考虑,满足Δw表-中/b≤5的时间为适宜的扩散时间。 6.5%Si high silicon steel was manufactured by using CVD method and the process was introduced,the influence of temperature on the siliconizing rate and quality reducing rate,diffusion time on silicon distribution were investigated.Results as follows: the siliconizing rate will increase quickly when the temperature is higher than 1050 ℃,but the siliconizing rate will become steadily as the temperature up to 1200 ℃;The quality reducing rate will increase with the elevating of temperature and the r... 

变压器D21硅钢铁芯片采用冲压工艺生产。首先对其工艺进行了分析,确定了冲压方案。对产品进行了排样设计,计算了冲压力,确定了压力中心。然后,设计了单工序落料模具,完成了模具装配图。 D21 silicon steel chips for transformer are produced by stamping.First,its stamping process was analyzed and the scheme of the stamping process was determined.The product layout was designed,the punching pressure was calculated,the pressure center was determined.Then,the blanking die with single procedure was designed,the die assembly drawing was completed. 

采用EBSD检测技术,分析了50W800无取向电工钢在重要生产工序间织构的演变以及织构沿带钢宽度方向上的差异性。结果表明:热轧板织构沿带钢宽度方向上的差异性主要体现在表层织构。带钢边部表层织构主要由旋转立方织构、α纤维织构以及少量的γ纤维织构组成,带钢宽度1/4处的表层织构主要存在高斯织构,带钢宽度1/2处的表层织构主要为(110)面织构以及少量的铜型织构。各处的带钢宽度1/4处和1/2处的织构类型基本一致,都以α纤维织构和旋转立方织构为主。冷轧后,各处的表层织构类型差异较小,均为γ纤维织构和α纤维织构。由板宽边部至中心处织构强度值逐渐降低。退火后,各处织构的组分基本一致,为较强的γ纤维织构和较弱的(100)面织构。各处织构强度值差异较小,变化趋势与冷轧板一致。 The texture of non-oriented electrical steel 50W800 was detected by EBSD technique.The evolution of the texture between important processes and the difference of texture along the width direction of strip were analyzed.The result shows that the difference along the width direction of strip of texture at the surface of hot rolled plate is most obvious.The texture at the surface of strip edge is primarily made of rotating cube texture,αfiber texture and weakγfiber texture.Goss texture is mainly co... 

从影响高牌号无取向硅钢退火工艺的主要参数入手,介绍高牌号无取向硅钢退火炉在加热、气氛控制、冷却、涂层烘烤方面的新技术,并展望无取向硅钢退火炉的发展方向。 Based on the technology parameters of high-grade non-oriented silicon steel annealing,the new technology of the annealing line,which includes heating,atmosphere control,cooling,coating baking,is introduced,and the development direction of non-oriented silicon steel annealing furnace is pointed out. 

【作者】 胡志强； 张文康； ...

对低温加热工艺生产的以AlN为主抑制剂的高磁感取向硅钢高温退火过程进行中断实验,借助电子背散射衍射技术对高温退火过程中高斯晶粒的演变进行了研究.在升温过程中高斯晶粒平均尺寸先减小再增大.800℃时取向分布函数图出现高斯织构组分,但强度很弱,高斯晶粒偏离角在10°以上;900℃时高斯晶粒平均生长速率超过其他晶粒;950~1000℃时高斯晶粒异常长大,偏离角3°~6°;在1000℃之前高斯取向晶粒相比于其他晶粒没有尺寸优势. The high-temperature annealing process of high permeability grain-oriented silicon steel with AlN as an inhibitor was studied by interrupting test.The evolution of Goss texture in this process was analyzed by electron back-scattered diffraction.It is found that the Goss grain size first decreases and then increases with the rise of temperature.Goss texture appears in the orientation distribution function at 800 ℃,but the intensity is very weak and the deviation angle is more than 10°.The average... 

【作者】 朱一知； 高军军； ...