【摘要】 采用磁控溅射方法,分别在纯Fe以及低硅钢基片上沉积富Si膜,并对其进行真空扩散热处理.通过能谱分析及X射线衍射研究了Si在纯Fe与低硅钢基体中的扩散特征,运用DICTRA软件建立了扩散模型.研究发现Si在纯Fe基体中扩散时发生γ-Fe(Si)→α-Fe(Si)相转变,扩散速率受控于相界面的迁移.当沿截面Si含量梯度不足以驱动相界面正向迁移时,延长扩散时间会发生相界面回迁现象,最终趋于单一相内均匀化扩散过程.Si在低硅钢基体中的扩散符合Fick扩散第二定律.
【Abstract】 Si-rich films were deposited on pure iron and low-Si steel substrates by direct current magnetron sputtering,and then were subjected to vacuum annealing.The distribution characteristics of Si across Fe and low-Si steel substrates were studied by energy spectrum analysis(EDS) and X-ray diffraction(XRD).DICTRA software was used to simulate the diffusion models.It is found that the diffusion behavior of Si in the Fe substrate is from γ-Fe(Si) phase to α-Fe(Si) phase and the rate of diffusion is con…
硅合金；
磁控溅射；
扩散；
计算机模拟；
【Key words】 iron alloys；
silicon alloys；
magnetron sputtering；
diffusion；
computer simulation；
原文发表于《北京科技大学学报》2012年第10期
