硅钢资料

通过对辉光放电发射光谱参数的优化,以铁元素为内标来消除基体效应,建立了测定硅钢薄板中微量硼元素的方法。优化的实验参数为:放电电压1200 V,放电电流50 mA,预溅射时间40 s,积分时间10 s。校准曲线硼元素含量范围0.0001%~0.022%,相关系数大于0.999,测量结果与认定值一致,相对标准偏差小于10%。完全能够满足日常分析测试的要求。 A glow discharge optical emission spectrometry(GD-OES) method for determining trace boron element in silicon steel sheets were established through optimization of instrumental parameters and using Fe element as an internal standard to eliminate the matrix effect.The optimized instrumental parameters included discharge voltage,discharge current,pre-sputtering time and integration time,which are 1200 V,50 mA,40 s,and 10 s,respectively.The content of boron element that can be determined from the ca... 

介绍了普通取向硅钢(CGO)和高磁感取向硅钢(Hi-B)铸坯高温加热两次冷轧、一次冷轧和铸坯低温加热两次冷轧、一次冷轧法4种成熟生产工艺的主要技术参数,取向硅钢理论研究(Goss晶核和抑制剂)和生产技术现状。取向钢的发展趋势为:提高(110)[001]晶粒取向度,降低取向硅钢铁损,发展铸坯低温加热(≤1 300℃)和薄板坯连铸连轧流程生产取向硅钢工艺。 Main technology parameters of four developed process:cast bloom higher temperature heating-double cold rolling or single cold rolling,lower temperature heating-double cold rolling or single rolling process for production of common grain oriented silicon steel(CGO) and high magnetic induction grain oriented silicon steel(Hi-B),theory research on grain oriented steel(Goss nucleus and inhibitor) and present situation of process are summarized in this paper.The development trend of grain oriented si... 

绝缘涂层可以有效提高硅钢片的耐蚀、耐腐、磁、绝缘等性能，因此取向硅钢涂装绝缘涂层是取向硅钢生产过程中重要的一环。本文对取向硅钢含铬无机绝缘涂层以及氮化铬涂层的性能优缺点进行了介绍，并对国内无机含铬取向硅钢绝缘涂层及氮化铬涂层的研究现状进行了综述。最后对未来含铬无机绝缘涂层的研发方向进行了展望。 Insulation coating can effectively improve the corrosion resistance of silicon steel sheet, such as corrosion, magnetic, insulation performance, thus oriented silicon steel insulation coating is the important part of oriented silicon steel production process. In this paper, the inorganic insulation coating oriented silicon steel containing chromium and chromium nitride coating performance advantages and disadvantages are introduced.In addition, the research status of insulation coating and chrom... 

借助电子背散射(EBSD)技术对AlN为主抑制剂的Hi-B取向硅钢常化工艺的中间冷却制度进行了研究。结果表明:常化后试样均发生了完全再结晶,在60℃/s冷速下组织最均匀;在合适的冷却制度下常化板表层保留了强的Goss织构,它深入到1/4厚度处,并且形成对Goss织构有利的强{554}<225>织构。 The intermediate cooling system of Hi-B oriented silicon steel with AlN main inhibitor in normalizing process was studied by means of electron back diffraction(EBSD) technique. The results show that:the specimens after normalizing are fully recrystallization, and the microstructure is most uniform under the intermediate cooling rate of 60℃/s; under suitable cooling system, normalized plate surface retains strong Goss texture, it penetrates into the 1/4 thickness of the plate and forming strong {...