硅钢资料

采用拉伸试验和显微组织观测的方法确定了GTN损伤模型中的9个损伤参数,运用GTN损伤模型对冷轧硅钢薄板边部缺陷的扩展及边裂的产生进行了有限元模拟,并与预置缺口的钢板轧制试验进行对比。结果表明:轧制过程中边部缺陷是造成钢板边部裂纹萌生和扩展的一个重要原因,GTN损伤模型可用来预测含边部缺陷硅钢薄板在冷轧过程中边裂的产生;预测结果与试验结果基本一致。 The crack initiation and propagation of silicon steel strip with edge defect during cold rolling process was studied by using GTN damage model in this paper.Nine damage parameters in GTN model were identified by tensile testing and microstructure observing,and then the FE simulation of edge defect evolution of silicon steel strip during rolling process was conducted on the base of GTN damage model,and then the results were compared with rolling experimental results.The results show that the edge... 

研究了含铜低碳低硅无取向电工钢中的析出相及其析出机理.由能谱(EDS)及选区电子衍射(SAED)分析可知,铁素体基体上存在的大量弥散分布的等轴状析出相为类B2结构的铜.这些铜析出相的析出机理可以是一般析出、位错析出、台阶机理相间析出和弓出机理相间析出:一般析出在550、650和750℃三个等温温度均可发生;位错析出只发生在较低的等温温度(550℃),此时析出相呈特殊的平行短列状;台阶机理相间析出也可在上述三个等温温度下发生,但650℃等温时最有利于台阶机理相间析出,此时析出相平直列状分布;弓出机理相间析出只发生在较高的等温温度(750℃),析出相弯曲列状分布. Precipitates in low-carbon low-silicon non-oriented electrical steel containing Cu were studied and the precipitation mechanism was analyzed by means of energy dispersive spectrometry(EDS) and selected area electron diffraction(SAED).It is found that the equiaxed precipitates of Cu with B2-like structure distribute dispersively in the non-oriented electrical steel.The precipitation mechanism involves general precipitation,dislocation precipitation,interphase precipitations formed by the ledge me... 

将Fe-1.5Si硅钢试样分别在1 000~1 200℃空气条件下氧化30 min,观察发现在1 000℃和1 100℃时,氧化层与基体界面处存在硅酸亚铁,而当温度为1 200℃时,硅酸亚铁不但存在于界面处,同时也存在于氧化层中.将各温度下得到的带有氧化层的试样进行单道次热轧试验,压下率分别为10%和30%,发现1 000℃和1 100℃时,较高的压下率使氧化层破碎更加严重,但是单道次热轧未能改变氧化层的结构;当温度为1 200℃时,由于液态的硅酸亚铁的出现,单道次热轧能够将界面处的液化的硅酸亚铁层挤压到氧化层中,消除了硅酸亚铁层的钉扎基体的效应,改善了氧化层与基体界面的平直度. Specimens of Fe-1.5Si silicon steel were oxidized at 1 000 ~ 1 200 ℃ in air for 30 min.At 1 000 ℃ and 1 100 ℃ fayalite was observed at the scale/substrate interface.While at 1 200 ℃fayalite was found both at the scale/substrate interface and at the outer oxide layer.Then after the single-pass hot rolling process,with the compression ratio of 10% and 30%,it was found that at 1000 ℃ and 1 100 ℃,higher compression rate accelerated the broken of the scale layers,but the scale structure was not affec... 

对低温法生产的以AlN为主抑制剂的Hi-B取向硅钢高温退火过程进行了中断实验,借助EBSD及TEM技术对高温退火连续升温过程中织构与析出物的演变进行了研究。实验结果表明,800℃时ODF图出现高斯织构组分,但强度很弱,高斯晶粒偏离角在10°以上;950~1 000℃时高斯晶粒异常长大,偏离角3~6°;高温退火过程析出物主要有球形、规则立方形及不规则多面体形3种形貌,由于渗N的影响,Zener因子先增大再减小,并且析出物在高斯晶界前沿优先粗化。 The annealing process at high temperature of Hi-B silicon steel using low slab reheat temperature and with AlN as the inhibitor has been studied by interrupting test,and the evolution of texture and precipitates during continuous heating-up in the annealing process at high temperature was analyzed by EBSD and TEM. The results showed that Goss texture appears in ODF at 800 ℃,but the intensity of Goss texture was very weak and the deviation angle was more than10°. Goss grains grow abnormally durin... 

热轧轧制工艺对产品性能和轧制稳定性影响很大,对中低牌号无取向电工钢,当在两相区轧制时,热轧塑性明显降低,板形变坏,易出现边裂等情况。以50W1000为例,通过对其变形抗力进行研究,得出把两相区控制在F4与F5之间为最佳轧制工艺的结论。在此基础上制定了一套较为合理的热轧工艺制度。采用新的轧制工艺后,50W1000热轧精轧的稳定性明显改善,热轧产品合格率由开发初期的40%左右提高到95%以上。 The hot rolling process has great influence on product′s performance and rolling stability.For the low medium grade non-oriented electrical steel,when non-oriented electrical steel is rolled in tow phase region,the hot rolling plasticity reduces obviously,the shape of strip goes bad and easily to crack at the edge.The deformation resistance of 50W1000 steel was investigated.The results show that the optimal rolling process is to control the two phase region between F4 and F5.Based on the results... 

研究稀土Ce的添加对含Sn高磁感无取向电工钢磁性能及夹杂物的影响。对比分析了两种成分钢的磁性能以及各过程工艺条件下夹杂物种类和分布情况。结果表明,在含Sn高磁感无取向电工钢中加入稀土元素Ce可以粗化夹杂物,提高成品晶粒的均匀性,有效降低铁损;同时Ce的添加不影响Sn元素提高磁感的效果,磁感保持不变。 Effect of Ce on magnetic properties and inclusion of Sn-bearing high permeability non-oriented electrical steel was investigated. A comparative analysis of the magnetic properties and the types and distributions of inclusion in the two sheets with different composition shows that the addition of Ce to the Sn-bearing high permeability non-oriented electrical steel can coarse the inclusion,improve the homogeneity of the finished grain and effectively decrease the core loss. Also,the addition of Ce... 

采用光学显微镜和X射线衍射仪研究了常化退火处理对无取向硅钢热轧板和成品退火板显微组织和织构的影响。结果表明:常化退火处理消除了热轧板中的变形组织,促使变形晶粒完成再结晶;常化退火处理使高斯织构和立方织构易通过再结晶在变形带内形核和长大,可显著降低成品退火板的{111}和{112}不利织构组分的占有率,提高{100}和{110}有利织构组分的占有率,从而有利于提高无取向硅钢成品板的磁性能。 The effect of normalizing annealing treatment on microstructure and texture of non-oriented silicon steel hot rolled plates and final products were investigated by means of optical microscope and X-ray diffractometer analysis.The results show that the deformed microstructure of the hot rolled plates transformed into recrystallized grain after normalizing annealing treatment.The grains of Goss texture and cubic texture crystallographic orientation were formed and grown by recrystallization in the... 

【作者】 汤婧； ...

对低温加热工艺生产的普通取向(common grain-oriented,CGO)硅钢的高温退火过程进行了中断实验,材料为含3.0%Si、0.5%Cu、0.009 8%S(均为质量分数)的以Cu2S为主抑制剂的普通取向CGO钢。原始板坯厚度为230 mm,于1 200℃均热后经4道次粗轧、7道次精轧至2.3mm;热轧板采用两次冷轧法轧至0.3mm,中间完全脱碳退火,最后于1 200℃高温退火。最后样品的磁性能:铁损P17/50为1.182W/kg,磁感应强度B8为1.897T。借助配有EDAX OIM电子背散射衍射(EBSD)系统的ZEISS SUPRA 55VP扫描电子显微镜,对高温退火过程中高斯晶粒的演变进行了研究,结果表明:升温过程中晶粒尺寸增长缓慢,650℃时取向分布函数(ODF)图出现高斯织构组分,但强度很弱,高斯晶粒偏离角小于9°;950℃时高斯晶粒平均生长速度超过其他晶粒;950~1 000℃时高斯晶粒异常长大,偏离角降至约3°;在950℃之前高斯取向晶粒相比于其他晶粒没有尺寸优势。 The high-temperature annealing process of common grain-oriented(CGO)silicon steel was investigated by interrupting test.The samples were rolled from CGO silicon steel slab under low reheating temperature.The CGO silicon steel,taking Cu2S as the main inhibitor,contains3.0%Si,0.5%Cu,and 0.0098%S.The original casting slab is 230mm in thickness.After 1 200℃reheating,four-pass rough rolling and seven-pass finish rolling were conducted to make the thickness of the slab get to 2.3mm.Then the hot rolled... 

研究了取向硅钢制备过程中常见的两种冷轧工艺,主要研究了一阶段冷轧与两阶段冷轧+中间退火工艺对初次再结晶组织及织构的影响.结果表明:采用两阶段冷轧+中间退火工艺制备以Cu2S为主抑制剂的取向硅钢,其初次再结晶平均晶粒尺寸为18.1μm,高斯晶粒的体积分数为0.6%,迁移性强的重位点阵晶界(Σ5+Σ9)和高能晶界(20°~45°取向偏差角)所占比例分别为1.8%和50.4%.与一阶段冷轧工艺相比,其初次再结晶晶粒较细,且高斯晶核与特征晶界所占的比例较高,有利于高斯晶粒发生二次再结晶. Two common cold-rolling processes of grain oriented silicon steel and the effects of the single stage cold rolling and tw o-stage cold rolling w ith intermediate annealing processes on the primary recrystallization microstructure and texture w ere investigated. The results revealed that for the grain oriented silicon steel prepared under the tw o-stage cold rolling process w ith intermediate annealing w ith Cu 2 S as the main inhibitor,the average grain size of the primary recrystallization micr... 

采用磁控溅射方法,分别在纯Fe以及低硅钢基片上沉积富Si膜,并对其进行真空扩散热处理.通过能谱分析及X射线衍射研究了Si在纯Fe与低硅钢基体中的扩散特征,运用DICTRA软件建立了扩散模型.研究发现Si在纯Fe基体中扩散时发生γ-Fe(Si)→α-Fe(Si)相转变,扩散速率受控于相界面的迁移.当沿截面Si含量梯度不足以驱动相界面正向迁移时,延长扩散时间会发生相界面回迁现象,最终趋于单一相内均匀化扩散过程.Si在低硅钢基体中的扩散符合Fick扩散第二定律. Si-rich films were deposited on pure iron and low-Si steel substrates by direct current magnetron sputtering,and then were subjected to vacuum annealing.The distribution characteristics of Si across Fe and low-Si steel substrates were studied by energy spectrum analysis(EDS) and X-ray diffraction(XRD).DICTRA software was used to simulate the diffusion models.It is found that the diffusion behavior of Si in the Fe substrate is from γ-Fe(Si) phase to α-Fe(Si) phase and the rate of diffusion is con... 

分析了冲裁硅钢芯片时出现的质量问题,针对影响硅钢芯片冲裁质量的4大因素——人、原材料状态、工艺和工装进行了工艺试验和分析,根据原材料状态的差异,采用不同工艺方案,特别是如何合理选择冲裁模具间隙,解决了硅钢芯片冲裁时产生的主要质量问题,使冲裁的硅钢芯片达到最佳质量状态,并满足硅钢芯片的使用性能。 The problems occurred during silicon steel chip punching and the factors that affect the quality of silicon steel chip punching were analyzed,the factors include 4aspects,that is,people,raw material status,process and frock,at the same time,process tests and analysis aimed at the factors that affect punching quality were did,according to the difference of raw material status,corresponding process schedules wee taken,especially in how to reasonably select punching dies clearance,which solved the ...