硅钢资料

连续酸洗退火机组(CPAL)对于当前生产高磁感取向硅钢和高牌号无取向硅钢是必不可少的一个环节。常化炉是常化酸洗机组关键的组成部分。本文对国内自主建造的两条退火酸洗机组的工艺流程,特别是常化炉段进行了对比分析。总结出了常化炉的工艺及组成特点,对生产过程中暴露的问题进行了仔细的分析并提出了改进的意见,对于以后新建常化炉具有一定的提示作用。 The continous pickling annealing line(CPAL) is an essential step in producing high magnetic induction grain-oriented silicon steel and high grade non-oriented silicon steel.The normalizing furnace is a very important part of the CAPL.In this paper,the process flows of two CAPL with independent manufacture in our country have been compared,especially the part of normalizing furnaces.The characteristics of process and component are summarized and problems of the normalizing furnace during the prod... 

【作者】 韩超； 代智肄； ...

【作者】 卢鹏； ...

采用磁控溅射方法,分别在纯Fe以及低硅钢基片上沉积富Si膜,并对其进行真空扩散热处理.通过能谱分析及X射线衍射研究了Si在纯Fe与低硅钢基体中的扩散特征,运用DICTRA软件建立了扩散模型.研究发现Si在纯Fe基体中扩散时发生γ-Fe(Si)→α-Fe(Si)相转变,扩散速率受控于相界面的迁移.当沿截面Si含量梯度不足以驱动相界面正向迁移时,延长扩散时间会发生相界面回迁现象,最终趋于单一相内均匀化扩散过程.Si在低硅钢基体中的扩散符合Fick扩散第二定律. Si-rich films were deposited on pure iron and low-Si steel substrates by direct current magnetron sputtering,and then were subjected to vacuum annealing.The distribution characteristics of Si across Fe and low-Si steel substrates were studied by energy spectrum analysis(EDS) and X-ray diffraction(XRD).DICTRA software was used to simulate the diffusion models.It is found that the diffusion behavior of Si in the Fe substrate is from γ-Fe(Si) phase to α-Fe(Si) phase and the rate of diffusion is con... 

采用铸坯低倍组织检验和化学分析的方法,研究板坯连铸机二冷区电磁搅拌器电流和频率参数对无取向电工钢XG800WR板坯中心偏析和等轴晶率的影响,结果表明:铸坯等轴晶率随着搅拌器电流强度和电流频率的增大而增加。采用二冷区电磁搅拌可减小中心易偏析元素S的偏析,试验得出:减小铸坯S偏析效果最好的电磁搅拌参数为电流380～400A,频率6Hz。 The effect of electromagnetic stirring current and frequency parameter at secondary cooling area on the central segregation and equiaxed crystal ratio of XG800WR non - oriented electrical steels slab was investigated through the methods of chemical and macrostructure analysis.The results shows that the rate of equiaxed crystal zone is going up with increasing of current intensity and current frequency.Electromagnetic stirring in the secondary cooling area can be easily reduced segregation caused... 

基于简化的取向硅钢片模型,系统地对不同的交流激励下的硅钢叠片内铁损、交链磁通和空气中指定位置的法向漏磁的分布进行了\"单片级\"的测量,并建立了相应的硅钢叠片级问题的三维有限元分析模型,进行了大规模的数值计算分析。模型实验和数值分析的结果表明垂直进入硅钢片的漏磁通和损耗呈现浅透入的特点,在硅钢片内引起的涡流损耗在总铁损中占据了\"举足轻重\"的份额。用电磁场有限元分析软件MagNet瞬态场时步法计算结果与测量结果相吻合,说明本文方法研究复杂的硅钢叠片问题的有效性。 The measurement and 3D finite element analysis of the iron loss,interlinkage flux inside the laminated silicon steel sheets and the magnetic flux densities at the specified positions are carried out based on a verifying silicon steel sheet model.The modeling results show that the leakage flux vertically through the silicon steel sheets has the peculiarity of shin effect,and the eddy current loss caused by the AC leakage flux is a significant component of the total iron loss.The calculated result... 

采用化学气相沉积(CVD)渗硅处理工艺连续制备6.5%Si高硅钢,具有优质的软磁性能,通过理论研究化学反应并且用简单的试验设备做进一步的探讨。根据试验的结果对连续制备6.5%Si高硅钢的CVD工艺构造提出全面、有效的建议,实现制备6.5%Si高硅钢系统。 CVD method for continuously manufacturing 6.5%Si Steel Sheet has excellent soft magnetic.Carried out a theoretical study of related chemical reaction and performing basic research with a simple test apparatus.Based on the results,finally proposed an overall process configuration to realize such a production-CVD method for continuously manufacturing 6.5%Si Steel Sheet. 

通过Axio Imager金相显微镜考察4.5%~7.0%硅(质量分数)对高硅钢材料组织形貌的影响,并利用Fe-6.5%Si高硅钢薄板制备方法对其进行轧制,通过DDL50电子万能试验机对阶段产品进行力学性能测试。结果证明,硅含量为5.58%的高硅钢在实验硅含量区间内存在最大延伸率及最小铸态组织晶粒尺寸。 An investigation about the influence of 4.5%-7.0% Si on microstructure and mechanical properties of high-silicon steel was presented.SEM was adopted to take an observation towards microstructure during fabrication,and DDL50electronic universal testing machine was applied into the detection of tensile curves.The results show that silicon steel with 5.58% Si provides the maximum elongation and minimum grain size as cast. 

2.9 mm热轧3%Si高牌号无取向硅钢板（/%:0.004 6C、3.04Si、0.32Mn、0.49Als、0.004S、0.013P、0.0042N）由CSP（Compact Strip Production紧凑式带材生产线）流程:120 t BOF-70 mm CC-热轧工艺生产。热轧终轧温度872℃,卷取温度683℃。铸坯及热轧板的组织和夹杂物的分析结果表明,铸坯组织为典型的贯穿柱状晶组织;热轧板边部为再结晶组织,中部为纤维组织带有少量再结晶晶粒;高牌号无取向硅钢的主要夹杂物为铸坯-Al₂O₃,AlN和Cu₂S+MnS;热轧板-Al₂O₃,AlN,AIN+MnS和Cu₂S+MnS。 The 2.9 mm hot rolled 3%Si high grade non-oriented silicon steel plate（/%:0.004 6C,3.04Si, 0.32Mn,0.49Als,0.004S,0.013P,0.004 2N） is produced by CSP（Compact Strip Production） flow sheet i.e.120 t BOF-70 mm CC-hot rolling process with end rolling at 872℃and coiling at 683℃.The analysis results on structure and inclusions in casting slab and hot rolled plate show that the structure of slab is typical trans-columnar crystal,the structure of hot rolled plate at edge is recrystallized grain and in ce... 

试验研究了退火温度(850~950℃)和时间(5~18 min)对2.3 mm热轧硅钢板(/%:0.036C,3.15Si,0.21Mn,0.005P,0.007S,0.032A1)6道次轧制的0.35 mm冷轧板组织和织构的影响。结果表明,退火温度越高,晶粒平均尺寸越大,900℃5 min退火时平均晶粒尺寸41.39μm,试样织构主要集中在γ取向线上的{111}<112>织构组分和{111}<110>织构组分;900℃18 min退火时平均晶粒尺寸为48.08μm,试样的{111}面织构和{112}面织构密度都明显减弱,{001}面织构增强,磁性能较优。 The effect of annealing temperature(850 ~950 ℃) and holding time(5 ~ 18 min) on structure and texture of 0.35 mm sheet by 6 passes cold-rolling from 2.3 mm hot-rolled plate of silicon steel(/%:0.036 C,3.15 Si,0.21 Mn,0.005 P,0.007 S,0.032A1) has been tested and studied.Results show that the higher the annealing temperature the coarser the average grain size;As annealing at 900 ℃ for 5 min the average grain size of steel sheet is 41.39 μm,and the texture in sample is mainly concentrated in y orie... 

介绍了电工钢生产线连退机组的表面处理工艺,特别是电解清洗系统的工作机理、设备构造、生产工艺及各种影响因素。 This paper introduces the technology of surface treatment of continuous annealing unit in electrical steel production line,in particular the working mechanism,structure of equipment,production techniques and various influence factors of the electrolytic cleaning system. 

采用CVD法制备6.5%Si高硅钢,介绍了具体的制备工艺过程,研究了温度对渗硅速率和试样质量减轻的影响,同时分析了扩散时间对高硅钢中硅分布的影响。结果表明:在CVD反应过程中,反应温度高于1050℃将大大提高渗硅速率,但当温度大于1200℃后,渗硅速率趋于稳定;渗硅后,试样会减轻、减薄,随着温度升高,试样质量减轻的速率逐渐增大,在1200℃左右趋于稳定;扩散时间越长,硅分布越均匀,结合制备效率进行考虑,满足Δw表-中/b≤5的时间为适宜的扩散时间。 6.5%Si high silicon steel was manufactured by using CVD method and the process was introduced,the influence of temperature on the siliconizing rate and quality reducing rate,diffusion time on silicon distribution were investigated.Results as follows: the siliconizing rate will increase quickly when the temperature is higher than 1050 ℃,but the siliconizing rate will become steadily as the temperature up to 1200 ℃;The quality reducing rate will increase with the elevating of temperature and the r...